introduction to mems design:

Content

Introduction to VLSI Technology

Design and Technology Overview of VLSI - I

Design and Technology Overview of VLSI – II

Yield and cost Estimation of VLSI Chips

Defects, Contamination & Clean Room Requirements

Wafer Cleaning Technology

Oxidation of Silicon

Reaction Kinetics of Oxide Growth in Silicon

Oxidation Techniques, Growth Rate & Characterization

Lithography Process

Photoresists

Optical Lithography Techniques

Exposure Tools and Optical Effects in Lithography

Advanced Lithography Techniques (X-ray,Ion-Beam,E-Beam)

Etching

Dry & Plasma Etching

Dry & Plasma Etching

Diffusion Theory and Diffusion Systems

Impurity Diffusion in Semiconductors

Diffusion Theory and Diffusion Systems

Impurities in Silicon and Diffusion Profile

Evaluation of Diffused Layers in Semiconductors

Ion Implantation : Range Theory and Stopping Mechanism

Ion Implantation Theory and Channeling

Ion Implant Machine

High Energy High Dose Implantation

Epitaxy Techniques and Classifications

Vapor Phase and Liquid Phase Epitaxy

VPE Growth Kinetics and MBE

Defects in Epitaxy Growth, Selective Epitaxy

Chemical Vapor Deposition (CVD): APCVD, LPCVD

CVD Techniques: PECVD, RTCVD, UHVCVD

Metal CVD and MOCVD

Materials for Contacts and Interconnects in VLSI

Metallization Techniques - I : Physical Evaporation

Metallization Techniques - II : Sputtering

Metallization Problems and Failure Mechanisms

Silicides and Copper Metallization

Isolation Technology in VLsI

Advanced Isolation Technology in VLSI

Bipolar VLSI Process Technology

CMOS or BiCMOS Process Technology

MOS VLSI Process Technology

Advanced VLSI MOS/CMOS Process

CMOS/BiCMOS Process Technology

VLSI Assembly & Packaging : Chip and Wire Bonding

VLSI Packaging Technology

Textbooks 

Introduction to Microelectronic Fabricationm Jaeger
Microsystem Design, Senturia, Stephen D
Micro-machined Transducers Sourcebook, Gregory T. Kovacs